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Molecular Dynamics Simulation of the Crystal Orientation and Temperature Influences in the Hardness on Monocrystalline Silicon

机译:单晶硅硬度晶体取向和温度影响的分子动力学模拟

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摘要

A nanoindentation simulation using molecular dynamic (MD) method was carried out to investigate the hardness behavior of monocrystalline silicon with a spherical diamond indenter. In this study, Tersoff potential was used to model the interaction of silicon atoms in the specimen, and Morse potential was used to model the interaction between silicon atoms in the specimen and carbon atoms in the indenter. Simulation results indicate that the silicon in the indentation zone undergoes phase transformation from diamond cubic structure to body-centred tetragonal and amorphous structure upon loading of the diamond indenter. After the unloading of the indenter, the crystal lattice reconstructs, and the indented surface with a residual dimple forms due to unrecoverable plastic deformation. Comparison of the hardness of three different crystal surfaces of monocrystalline silicon shows that the (0 0 1) surface behaves the hardest, and the (1 1 1) surface behaves the softest. As for the influence of the indentation temperature, simulation results show that the silicon material softens and adhesiveness of silicon increases at higher indentation temperatures.
机译:进行了使用分子动态(MD)方法的纳米indentation模拟,以研究单晶硅用球形金刚晶粘贴的硬度行为。在该研究中,纺织潜力用于模拟样品中硅原子的相互作用,并且莫尔斯潜力用于模拟压痕中标本和碳原子中的硅原子之间的相互作用。仿真结果表明,压痕区中的硅在装载金刚石压痕时从金刚石立方结构与金刚石立方体结构的相变,以体为中心的四边形和非晶结构。在卸载压痕之后,由于不可恢复的塑性变形,晶格重建,并且具有残余凹坑形式的凹陷表面。单晶硅三种不同晶体表面的硬度的比较表明(0 0 1)表面的表现最强,并且(111)表面表现最柔软。至于压痕温度的影响,仿真结果表明,硅材料软化和硅的粘合性在更高的压痕温度下增加。

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