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Optical lithography technique for the fabrication of devices from mechanically exfoliated two-dimensional materials

机译：光学光刻技术从机械剥离二维材料制造装置

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Rui Zhang; Tao Chen; Andrew Bunting; Rebecca Cheung;
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1. Optical lithography technique for the fabrication of devices from mechanically exfoliated two-dimensional materials [J] . Zhang Rui, Chen Tao, Bunting Andrew, Microelectronic Engineering . 2016,第mara期

机译：用机械剥离二维材料制造器件的光学光刻技术
2. Fabrication and Replication of Polymer Integrated Optical Devices Using Electron-Beam Lithography and Soft Lithography [J] . Yanyi Huang, George T.Paloczi, Amnon Yariv, The journal of physical chemistry, B. Condensed matter, materials, surfaces, interfaces & biophysical . 2004,第25期

机译：电子束光刻和软光刻技术制造和集成聚合物集成光学器件
3. Edge orientations of mechanically exfoliated anisotropic two-dimensional materials [J] . Juntan Yang, Yi Wang, Yinfeng Li, Journal of the Mechanics and Physics of Solids . 2018,第MARa期

机译：机械剥离各向异性二维材料的边缘取向
4. Lithography of porous materials for devices fabrication [C] . Paolo Falcaro, Plinio Innocenzi, Anita J. Hill, Smart nano-micro materials and devices . 2011

机译：用于设备制造的多孔材料的光刻
5. Fabrication of two-dimensional nanostructure array using nanosphere lithography and RIE etching and its application in optical devices. [D] . Wang, Jinsong. 2007

机译：使用纳米球面光刻和RIE刻蚀制造二维纳米结构阵列及其在光学器件中的应用。
6. Modulus of Elasticity of Two Ceramic Materials and Stress-Inducing Mechanical Deformation following Fabrication Techniques and Adhesive Cementation Procedures of a Dental Ceramic [O] . G. Isgrò, D. Rodi, A. Sachs, 2019

机译：两种陶瓷材料的弹性模量和牙科陶瓷的制备技术和胶结胶凝程序后的应力诱导机械变形
7. High contrast 3D proximity correction for electron-beam lithography: An enabling technique for the fabrication of suspended masks for complete device fabrication within an UHV environment [O] . Rosamond MC, Batley J, Burnell G, 2015

机译：用于电子束光刻的高对比度3D接近校正：用于制造悬挂掩模的使能技术，用于在UHV环境中完成器件制造

Optical lithography technique for the fabrication of devices from mechanically exfoliated two-dimensional materials

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