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Laser conditioning characterization and damage threshold prediction of hafnia/silica multilayer mirrors by photothermal microscopy

机译：通过光热显微镜检查Hafnia /二氧化硅多层镜的激光调节表征和损伤阈值预测

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A. B. Papandrew; Christopher J. Stolz; Zhouling Wu; Gary E. Loomis; Steven Falabella;
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年度 2001
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1. Damage threshold prediction of hafnia-silica multilayer coatings by nondestructive evaluation of fluence-limiting defects [J] . Zhouling Wu, Christopher J. Stolz, Shannon C. Weakley, Applied optics . 2001,第12期

机译：通过注量限制缺陷的无损评估预测氧化ha-二氧化硅多层涂层的损伤阈值
2. Dual wavelength laser-induced damage threshold measurements of alumina/silica and hafnia/silica ultraviolet antireflective coatings [J] . Mrohs Marius, Jensen Lars, Guenster Stefan, Applied optics . 2016,第1期

机译：氧化铝/二氧化硅和氧化f /二氧化硅紫外增透膜的双波长激光诱导损伤阈值测量
3. Dual wavelength laser-induced damage threshold measurements of alumina/silica and hafnia/silica ultraviolet antireflective coatings [J] . Mrohs Marius, Jensen Lars, Guenster Stefan, Applied optics . 2016,第1期

机译：氧化铝/二氧化硅和氧化f /二氧化硅紫外增透膜的双波长激光诱导损伤阈值测量
4. Laser conditioning characterization and damage threshold prediction of hafnia/silica multilayer mirrors by photothermal microscopy [C] . A. B. Papandrew, C. J. Stolz, Z. L. Wu, Symposium on optical materials for high-power lasers . 2001

机译：通过光热显微镜检查Hafnia /二氧化硅多层镜的激光调节表征和损伤阈值预测
5. Bridging the nano- and macro-worlds: Thermal property measurement using thermal microscopy and photothermal radiometry - application to particle-irradiation damage profile in ZrC. [D] . Jensen, Colby Bruce. 2014

机译：桥接纳米世界和宏观世界：使用热显微镜和光热辐射法测量热性质-在ZrC中应用于粒子辐照损伤曲线。
6. Experimental study of EUV mirror radiation damage resistance under long-term free-electron laser exposures below the single-shot damage threshold [O] . Igor A. Makhotkin, Ryszard Sobierajski, Jaromir Chalupský, -1

机译：在单次损伤阈值以下的长期自由电子激光照射下EUV镜辐射损伤抵抗性的实验研究
7. Morphologies of laser-induced damage in hafnia-silica multilayer mirror and polarizer coatings [O] . Francois Y. Genin, Christopher J. Stolz 1996

机译：<标题> Hafnia-Silica多层镜和偏振片涂层激光诱导损伤的形态

Laser conditioning characterization and damage threshold prediction of hafnia/silica multilayer mirrors by photothermal microscopy

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