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Stability of Si-O-F low-K dielectrics: Attack by water molecules as function of near-neighbor Si-F bonding arrangements

机译：Si-O-F低k电介质的稳定性：水分子攻击作为近邻的Si-F粘接装置的功能

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H. Yang; G. Lucovsky;
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年度 1998
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1. Stability of Si-O-F low-K dielectrics: attack by water molecules as function of near-neighbor Si-F bonding arrangements [J] . H. Yang, G. Lucovsky Journal of Non-Crystalline Solids: A Journal Devoted to Oxide, Halide, Chalcogenide and Metallic Glasses, Amorphous Semiconductors, Non-Crystalline Films, Glass-Ceramics and Glassy Composites . 1999,第0期

机译：Si-O-F低K电介质的稳定性：水分子的侵蚀是近邻Si-F键排列的函数
2. Influence of water molecules arrangement on structure and stability of 512 and 51262 buckyball water clusters. A theoretical study [J] . Viorel Chihaia, Stefan Adams, Werner F. Kuhs Chemical Physics: A Journal Devoted to Experimental and Theoretical Research Involving Problems of Both a Chemical and Physical Nature . 2004,第1a3期

机译：水分子排列对512和51262布基球水团簇结构和稳定性的影响。理论研究
3. Extended Theory of U* to Electrostatic Problem and Its Application to Pore Arrangements for Porous Low-k and High-k Dielectric Film [J] . Shunsuke MIYAGAWA, Masaki OMIYA, Kunihiro TAKAHASHI Journal of Solid Mechanics and Materials Engineering . 2010,第3期

机译：U * 在静电学问题上的扩展理论及其在多孔低 k 和高 k 介电膜的孔排列中的应用
4. Stability of silicon-oxygen-fluorine and carbon-fluorine low-k dielectrics with respect to attack by water [C] . H.Yang, G.Lucovsky Symposium on low-dielectric constant materials . 1998

机译：硅-氧-氟和碳-氟低k电介质对水侵蚀的稳定性
5. Mechanical reliability of porous low-k dielectrics for advanced interconnect: Study of the instability mechanisms in porous low-k dielectrics and their mediation through inert plasma induced re-polymerization of the backbone structure. [D] . Sa, Yoonki. 2015

机译：用于高级互连的多孔低k电介质的机械可靠性：多孔低k电介质的不稳定性机理及其通过惰性等离子体引发的骨架结构再聚合的介导研究。
6. Broadband Dielectric Spectroscopic Characterization of Thermal Stability of Low-k Dielectric Thin Films for Micro- and Nanoelectronic Applications [O] . Christopher E. Sunday, Karl R. Montgomery, Papa K. Amoah, -1

机译：用于微和纳米电子应用的低k介电薄膜的热稳定性的宽带介电光谱表征
7. Extended Theory of U* to Electrostatic Problem and Its Application to Pore Arrangements for Porous Low-k and High-k Dielectric Film [O] . Shunsuke MIYAGAWA, Masaki OMIYA, Kunihiro TAKAHASHI 2010

机译：u * 的扩展理论是静电问题及其在孔隙布置的应用中的孔隙布置和高k 介电膜

Stability of Si-O-F low-K dielectrics: Attack by water molecules as function of near-neighbor Si-F bonding arrangements

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