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Overlay accuracy limitations of soft stamp UV nanoimprint lithography and circumvention strategies for device applications

机译：软印花UV纳米压印光刻和设备应用规避策略的覆盖精度限制

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P.J. Cegielski; J. Bolten; J.W. Kim; F. Schlachter; C. Nowak; T. Wahlbrink; A.L. Giesecke; M.C. Lemme;
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年度 2018
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1. Overlay accuracy limitations of soft stamp UV nanoimprint lithography and circumvention strategies for device applications [J] . Cegielski P. J., Bolten J., Kim J. W., Microelectronic Engineering . 2018,第octa期

机译：软印章UV纳米压印光刻的覆盖精度限制和器件应用的规避策略
2. High accuracy UV-nanoimprint lithography step-and-repeat master stamp fabrication for wafer level camera application [J] . G. Kreindl, T. Glinsner, R. Miller, Journal of Vacuum Science & Technology . 2010,第6期

机译：适用于晶圆级相机应用的高精度UV-纳米压印光刻分步重复主印章制造
3. Consecutive imprinting performance of large area UV nanoimprint lithography using Bi-layer soft stamps in ambient atmosphere [J] . Si Shuhao, Hoffmann Martin Microelectronic Engineering . 2017,第MAY期

机译：在环境大气中使用双层软印章进行大面积UV纳米压印光刻的连续压印性能
4. Integrated Soft UV-Nanoimprint Lithography in a Nanopositioning and Nanomeasuring machine for accurate positioning of stamp to substrate [C] . Shraddha Supreeti, Johannes Kirchner, Martin Hofmann, SPIE Advanced Lithography Conference . 2019

机译：纳米定位的集成软紫外线印刷光刻和纳米卷积机，用于精确定位印章到衬底
5. Advances in Large-area Nanopatterning by Nanoimprint Lithography and Applications in Light-emitting Devices [D] . Qi, Ji. 2018

机译：纳米压印光刻和发光器件应用的大面积纳米仪的研究进展
6. Resist Filling Study for UV Nanoimprint Lithography Using Stamps with Various Micro/Nano Ratios [O] . Minqi Yin, Hongwen Sun, Haibin Wang 2018

机译：使用具有各种微/纳米比的印模进行的紫外线纳米压印光刻的抗蚀剂填充研究
7. Soft UV Nanoimprint Lithography and Its Applications [O] . Hongbo Lan 2013

机译：软紫外线印刷光刻及其应用

Overlay accuracy limitations of soft stamp UV nanoimprint lithography and circumvention strategies for device applications

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