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Nutrient solutions for Arabidopsis thaliana: a study on nutrient solution composition in hydroponics systems

机译:拟南芥的营养溶液:水培系统中营养溶液组合物的研究

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摘要

Abstract Background There is little information on the effect of nutrient solutions composition on Arabidopsis growth. Therefore, we compared growth performance of Arabidopsis thaliana (Col-0) grown on the most commonly used nutrient solutions in deep water culture: Hoagland and Arnon, Murashige and Skoog, Tocquin, Hermans, and Conn. In addition to these nutrient solution composition experiments, we established Arabidopsis growth response curves for nutrient solution concentration and salt stress (NaCl). Results Arabidopsis rosette fresh and dry weight showed an approximate linear decline with NaCl dose in deep water culture, i.e. 9% reduction relative to control per unit of electrical conductivity (EC in dS m−1, for scale comprehension 1 dS m−1 equals ~ 10 mM NaCl). The Tocquin, ½Hoagland and Conn nutrient solutions had equal and optimal growth performance. Optimal nutrient solution concentration for Tocquin and Hoagland was 0.8 to 0.9 dS m−1. Close to the EC of ½Hoagland (1.1 dS m−1), which is frequently used in Arabidopsis research. Conn solution showed optimal growth at much higher EC (2 dS m−1) indicating that it is a balanced nutrient solution that matches the needs of Arabidopsis. Full Murashige and Skoog solution (5.9 dS m−1) was lethal and diluted solutions (EC of 1.6 and 1.1 dS m−1) caused stress symptoms and severe growth retardation at later developmental stages. Conclusions Arabidopsis thaliana (Col-0) plants grown in deep water culture showed a sixfold growth difference when commonly used nutrient solutions were compared. Murashige and Skoog solution should not be used as nutrient solution in deep water culture. Conn, Tocquin and ½Hoagland are balanced nutrient solutions which result in optimal Arabidopsis growth in hydroponic systems.
机译:抽象背景有关于营养液组成对拟南芥生长的影响的信息很少。因此,我们比较了拟南芥(COL-0)的拟南芥(COL-0)的生长性能在深水文化中最常用的营养解决方案:Hoagland和Arnon,Murashige和Skoog,Tocquin,Hermans和Conn。除了这些营养溶液组合物实验,我们建立了营养溶液浓度和盐胁迫(NaCl)的拟南芥生长响应曲线。结果拟南芥玫瑰花糖新鲜和干重显示近似线性下降与深水培养中的NaCl剂量,即相对于每单位电导率的控制(EC为DS M-1的EC,用于尺度理解1 DS M-1等于〜 10 mm nacl)。 Tocquin,½Hoagland和Conn营养解决方案具有相同且最佳的生长性能。 Tocquin和Hoagland的最佳营养溶液浓度为0.8至0.9ds M-1。靠近½hoagland(1.1ds m-1)的ec,其经常用于拟南芥研究。 Conn解决方案显示出高于EC(2ds M-1)的最佳增长,表明它是符合拟南芥需求的平衡营养解决方案。 Full Murashige和Skoog解决方案(5.9 DS M-1)是致命的,稀释的溶液(EC为1.6和1.1ds M-1),导致后续发育阶段的应力症状和严重的生长迟缓。结论在深水培养中生长的拟南芥(Col-0)植物在比较常用营养溶液时,六倍生长差异显示出六倍的生长差异。 Murashige和Skoog解决方案不应在深水培养中用作营养溶液。 Conn,Tocquin和½hoagland是平衡的营养溶液,导致水培系统中最佳的拟南芥生长。

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