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Comparison between absolute densities of metastable state and ground state of atoms in CZTS sputtering plasmas

机译：CZTS溅射等离子体中亚稳态和地层绝对密度的比较

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Nafarizal Nayan; Koichi Sasaki;
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1. Absolute densities of Cu, Zn, Sn, and S atoms in magnetron sputtering plasmas employing a Cu2ZnSnS4 target [J] . Nafarizal Nayan, Sasaki Koichi Japanese journal of applied physics . 2016,第7S2期

机译：使用Cu2ZnSnS4靶的磁控溅射等离子体中Cu，Zn，Sn和S原子的绝对密度
2. Absolute number densities of helium metastable atoms determined by atomic absorption spectroscopy in helium plasma-based discharges used as ambient desorption/ionization sources for mass spectrometry [J] . Charlotte Reininger, Kellie Woodfield, Joel D. Keelor Spectrochimica Acta, Part B. Atomic Spectroscopy . 2014,第Null期

机译：通过原子吸收光谱法测定的氦等离子体等离子体放电中氦亚稳原子的绝对数密度，该等离子体放电用作质谱的环境解吸/电离源
3. Production of Ar metastable atoms in the late afterglow of pulse-modulated rf magnetron sputtering plasmas [J] . Nafarizal N, Takada N, Sasaki K Journal of Physics, D. Applied Physics: A Europhysics Journal . 2008,第3期

机译：脉冲调制射频磁控溅射等离子体的余辉后期产生Ar亚稳原子
4. Measurements of absolute Cu, Zn and Sn metastable densities in CZTS sputtering plasmas measured using UVAS technique [C] . Nayan Nafarizal, Koichi Sasaki IEEE International Conference on Semiconductor Electronics . 2016

机译：使用UVAS技术测量CZTS溅射等离子体中的绝对Cu，Zn和Sn亚稳态密度
5. Measurements of metastable atom density using energies and densities of energetic “fast” electrons detected in the electron energy distribution function associated with the afterglow plasma produced by a radio frequency inductively coupled plasma helium discharge [D] . Blessington, Jon C. 2007

机译：使用能量和高能“快速”电子的密度测量亚稳态原子密度，电子能量分布函数中检测到与射频感应耦合等离子体氦放电产生的余辉等离子体相关的电子能量分布函数
6. Excitation of Metastable Levels in Low Density Nebular Plasmas: SII and ArIV [O] . S. J. Czyzak, T. K. Krueger, L. H. Aller 1970

机译：低密度神经元血浆中亚稳态水平的激发：SII和ArIV
7. Measured density of copper atoms in the ground and metastable states in argon magnetron discharge correlated with the deposition rate [O] . H Naghshara, S Sobhanian, S Khorram, 2010

机译：在氩气磁控管放电中测得的铜原子密度和亚稳态与沉积速率相关
8. Comparisons of physical and chemical sputtering in high density divertor plasmas with the Monte Carlo Impurity (MCI) transport model [R] . Evans, T. E. , Loh, Y. S. , West, W. P. , 1997

机译：高密度偏滤等离子体中物理和化学溅射与蒙特卡罗杂质（mCI）传输模型的比较

Comparison between absolute densities of metastable state and ground state of atoms in CZTS sputtering plasmas

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