首页>
外文OA文献
>Characterization of lateral asymmetric channel (LAC) thin film SOI MOSFETs
【2h】
Characterization of lateral asymmetric channel (LAC) thin film SOI MOSFETs
展开▼
机译:横向非对称沟道(LAC)薄膜SOI MOSFET的特性
展开▼
免费
页面导航
摘要
著录项
相似文献
相关主题
摘要
This paper presents results on the characterization of Lateral Asymmetric Channel (LAC) thin film silicon-on-insulator (SOI) MOSFETs. These devices are compared with conventional SOI MOSFETs having uniform channel doping. The measurements have been taken for a number of channel lengths, silicon film thicknesses, and tilt angles of implantation. The aspects studied include threshold voltage roll-off, kink effect, gate induced drain leakage (GIDL) and parasitic bipolar transistor action. Measurements have been supplemented by device simulations. The LAC devices show excellent characteristics, with many advantages over the conventional devices.
展开▼