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Performance and reliability of single halo deep sub-micron p-MOSFETs for analog applications

机译:用于模拟应用的单光晕深亚微米p-MOSFET的性能和可靠性

摘要

The effect of channel hot carrier (CHC) stress under typical analog operating conditions is studied for the first time for single halo (SH) p-MOSFET devices. The SH devices show less degradation under identical operating conditions compared to conventional MOSFETs. The effect of SH implant parameters on device degradation is presented.
机译:对于单光环(SH)p-MOSFET器件,首次研究了典型模拟工作条件下的沟道热载流子(CHC)应力的影响。与常规MOSFET相比,SH器件在相同的工作条件下显示出较少的退化。提出了SH植入物参数对器件降解的影响。

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