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Effect of annealing on magnetic properties in ferrimagnetic GdCo alloy films with bulk perpendicular magnetic anisotropy

机译:用散装垂直磁各向异性的铁磁性Gdco合金薄膜磁性退火对磁性的影响

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摘要

Magnetic properties in ferrimagnetic GdCo alloy films with bulk perpendicular magnetic anisotropy (PMA) are investigated as a function of annealing temperature (Tanneal) and annealing time for several capping layers. Magnetic properties in films capped by TaOx vary markedly with Tanneal; the saturation magnetization and coercivity vary progressively with increasing Tanneal up to 300°C, and above that temperature, PMA is lost abruptly. By comparing the annealing temperature dependence for Co-dominated and Gd-dominated compositions close to the magnetization compensation point, the data are readily explained by preferential oxidation of Gd during annealing. When films are capped by a Ta/Pt bilayer, the film properties are stable up Tanneal = 300 °C, indicating that oxidation at high temperatures is effectively blocked, but the abrupt loss of PMA for Tanneal > 300 °C is still observed. X-ray diffraction measurement reveals that the amorphous structure of the films remains the same after high-temperature annealing that is sufficient to remove PMA, indicating that crystallization from the amorphous phase is not responsible for the lack of PMA. Instead, our results suggest that high annealing temperatures may cause segregation of Co and Gd atoms in the films, which reduces anisotropic pair-pair correlations responsible for the observed bulk PMA in the as-grown state.
机译:作为几种封端层的退火温度(Tanneal)和退火时间的函数,研究了具有本体垂直磁各向异性(PMA)的磁性性质。通过Taxox覆盖的薄膜中的磁性明显不同于Tangeal;饱和磁化强度和矫顽力随着Tangeal的增加而逐渐变化,高于该温度,PMA突然丧失。通过比较与磁化补偿点接近磁化补偿点的共控制和GD主导组合物的退火温度依赖性,通过退火期间Gd的优先氧化易于解释数据。当薄膜通过Ta / Pt双层封端时,膜性质是稳定的Tanneal = 300℃,表明在高温下氧化得到有效地阻断,但仍然观察到Tanneal> 300℃的PMA突然损失。 X射线衍射测量显示,在足以去除PMA的高温退火后,薄膜的无定形结构保持不变,表明来自非晶相的结晶对于缺乏PMA不负责任。相反,我们的结果表明,高退火温度可能导致薄膜中的CO和GD原子的偏析,这减少了负责以生长状态的观察到的批量PMA负责的各向异性对相关性。

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