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Effects of Sputter Pressure on the Properties of Sputtered ZnO:Al Films Deposited on Plastic Substrate

机译：溅射压力对塑料基质溅射ZnO：Al膜性能的影响

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1. Effects of sputtering pressure and thickness on properties of ZnO:Al films deposited on polymer substrates [J] . Jae-Hyeong Lee Journal of electroceramics . 2009,第2a4期

机译：溅射压力和厚度对聚合物基底上ZnO：Al膜性能的影响
2. Effects of sputtering pressure and thickness on properties of ZnO:Al films deposited on polymer substrates [J] . Jae-Hyeong Lee Journal of Electroceramics . 2009,第2a4期

机译：溅射压力和厚度对聚合物基底上ZnO：Al薄膜性能的影响
3. Effects of sputtering pressure on properties of Al doped ZnO thin films dynamically deposited by rf magnetron sputtering [J] . Zhou H B1, Zhang H Y1, Tan M L2, Materials Research Innovations . 2012,第6期

机译：溅射压力对射频磁控溅射动态沉积铝掺杂ZnO薄膜性能的影响
4. Effects of sputtering gas pressure and substrate temperature on opitcal properties of ZnO:Al thin films fabricated by RF magnetron sputtering [C] . 2010 OSA-IEEE-COS Advances in Optoelectronics and Micro/Nano-Optics . 2010

机译：溅射气压和衬底温度对射频磁控溅射制备ZnO：Al薄膜光学性能的影响
5. Microstructural and Compositional Tunability in Sputter-Deposited Transition-Metal Carbide Thin Films Using Ultra-Low Reactive Gas Pressures and 2D Layers [D] . ?Tanaka, Koichi 2020

机译：微观结构和组成的可调性在溅射沉积过渡金属碳化物薄膜使用超低反应气体压力和2D 层
6. Spatially Resolved Optoelectronic Properties of Al-Doped Zinc Oxide Thin Films Deposited by Radio-Frequency Magnetron Plasma Sputtering Without Substrate Heating [O] . Eugen Stamate 2020

机译：在不加热衬底的情况下通过射频磁控等离子体溅射沉积的铝掺杂氧化锌薄膜的空间分辨光电性能
7. Effects of Substrate-Target Distance and Si Co-Doping on the Properties of Al-Doped ZnO Films Deposited by Magnetron Sputtering [O] . XU Hao, LU Fang, FU Zheng-Wen 2011

机译：基质 - 靶距离和Si共掺杂对磁控溅射沉积的铝锌膜性能的影响
8. Substrate surface effects on the properties of sputter-deposited and laser-irradiated films. [R] . A. J. Pedraza M. J. Godbole L. Romana 1991

机译：衬底表面对溅射沉积和激光照射薄膜性能的影响。

Effects of Sputter Pressure on the Properties of Sputtered ZnO:Al Films Deposited on Plastic Substrate

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