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Impact of Ar Flow Rates on Micro-Structural Properties of WS2 Thin Film by RF Magnetron Sputtering

机译：AR流速对RF磁控溅射的WS2薄膜微结构性能的影响

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Md. Akhtaruzzaman; Md. Shahiduzzaman; Nowshad Amin; Ghulam Muhammad; Mohammad Aminul Islam; Khan Sobayel Bin Rafiq; Kamaruzzaman Sopian;
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1. Effects of Ar flow rate and substrate temperature on the properties of AZO thin films by RF magnetron sputtering [J] . Optoelectronics and Advanced Materials-Rapid Communications . 2010,第2010期

机译：射频磁控溅射中Ar流量和衬底温度对AZO薄膜性能的影响
2. Effect of Ar:N-2 flow rate on morphology, optical and electrical properties of CCTO thin films deposited by RF magnetron sputtering [J] . Ahmadipour Mohsen, Arjmand Mohammad, Ain Mohd Fadzil, CERAMICS INTERNATIONAL . 2019,第12期

机译：AR：N-2流速对RF磁控溅射沉积的CCTO薄膜的形态，光学和电性能
3. Effects of RF Power and O_2/Ar Flow Ratio on the Properties of AZO Thin Films for Transparent Electrodes Deposited by RF Magnetron Sputtering [J] . Chongmu Lee, Keunbin Yim Journal of Korean Institute of Metal and Materials . 2005,第12期

机译：射频功率和O_2 / Ar流量比对射频磁控溅射沉积透明电极AZO薄膜性能的影响
4. Dielectric properties of AlNx thin films prepared by RF magnetron sputtering of Al using a N2/Ar sputtering gas mixture [C] . R.D. Gould* S.A. Awan International Conference on Metallurgical Coatings and Thin Films . 2006

机译：使用N2 / AR溅射气体混合物通过RF磁控溅射制备的ALNX薄膜的介电性能
5. Structural, magnetic and surface properties of RF magnetron sputtered undoped lanthanum manganite thin films. [D] . Sakhalkar, Varad Rajan. 2009

机译：射频磁控溅射未掺杂镧锰矿薄膜的结构，磁性和表面特性。
6. XPS Depth Profile Analysis of Zn3N2 Thin Films Grown at Different N2/Ar Gas Flow Rates by RF Magnetron Sputtering [O] . M. Baseer Haider 2017

机译：射频磁控溅射在不同N2 / Ar气体流量下生长的Zn3N2薄膜的XPS深度剖面分析
7. XPS Depth Profile Analysis of ZnN Thin Films Grown at Different N/Ar Gas Flow Rates by RF Magnetron Sputtering [O] . 2017

机译：射频磁控溅射在不同N / Ar气体流量下生长的ZnN薄膜的XPS深度剖面分析

Impact of Ar Flow Rates on Micro-Structural Properties of WS2 Thin Film by RF Magnetron Sputtering

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