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Trapping and detrapping effects in high-quality chemical-vapor-deposition diamond films: Pulse shape analysis of diamond particle detectors

机译:高质量化学蒸汽沉积金刚石薄膜中的捕获和脱落效应:金刚石粒子探测器的脉冲形状分析

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摘要

An analysis of the time evolution of the response of diamond particle detectors is carried out, using as a probe 5.5 MeV α particles impinging on high-quality diamond films grown by microwave chemical vapor deposition (CVD). Both the amplitude and the time evolution of the pulses are shown to change drastically when the detector is preirradiated with β particles (pumping), a slow component developing after pumping, indicating carriers trapping and releasing (detrapping). Pulse shapes obtained for positive and negative detector polarities are compared in both the as-grown and pumped states. The presence of at least two trapping centers for holes is necessary to explain the results, the shallower having an activation energy of about 0.3 eV. The effects of pumping are clarified, and the different role played by electrons and holes is evidenced. We modify a previous model for trapping-detrapping behavior originally applied to Si(Li) detectors to describe the more complex behavior of CVD diamond detectors, and develop a computer simulation based on it. The simulated pulse shapes agree very well with experiment with reasonable values of the physical parameters involved, making this technique helpful for studying and identifying defects which are responsible for limitation of the efficiency of CVD diamond particle detectors. Field-assisted detrapping seems to take place for fields of about 104 V/cm.
机译:使用撞击在微波化学气相沉积(CVD)上生长的高质量金刚石膜上的5.5 MeVα颗粒作为探针,对金刚石颗粒检测器的响应随时间的变化进行了分析。当检测器受到β粒子的预辐照(泵浦)时,脉冲的幅度和时间演化都显示出急剧变化,泵浦后形成了一个缓慢的分量,表明载流子被俘获并释放(去陷获)。比较正态和负态检测器极性获得的脉冲形状,包括生长状态和泵浦状态。必须有至少两个空穴捕获中心来解释结果,较浅的空穴具有约0.3 eV的活化能。阐明了泵浦效应,并证明了电子和空穴的不同作用。我们修改了以前用于Si(Li)检测器的捕集-捕集行为的先前模型,以描述CVD金刚石检测器的更复杂行为,并在此基础上开发了计算机模拟。模拟的脉冲形状与合理的相关物理参数值与实验非常吻合,从而使该技术有助于研究和识别导致CVD金刚石颗粒探测器效率受到限制的缺陷。对于约104 V / cm的磁场,似乎发生了场辅助的去陷阱。

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