Study oftime deposition dependence of Cu20 films,fabricated by sputtering method

摘要

This research was conducted to fabricate films using p-types oxides. In this research, glass which has good transparency, Is used as a substrate while CU20 is used as p-type semiconductor target CU20 films were deposited on glass substrates by Radio Frequency (RF) sputtering method at different duration time of 10, 20, 30, 40 and 50 minutes and the effect of duration time on surface, structural and optical of the films was presented. The surface properties were characterized by USing profilometer. The film structures were studied by X-ray diffraction (XRD). To obtain Information about structural properties In detail, the grain size (D) and FWHM were calculated. Optical properties of the films were analyzed by transmission, linear absorption coeffident and the optical method was used to detennine the band gap of the films. So, It was determined that duration time has a strong effect on the structural, surface and optical