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A Study on the properties of amorphous boron and borne-silicon alloy films prepared by low pressure chemical vapour deposition.

机译：低压化学气相沉积法制备非晶硼及硼硅合金薄膜的性能研究。

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by Ong Chung Wo.

机译：王仲和。

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年度 1991
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正文语种 eng
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1. IN SITE BORON-DOPED POLYCRYSTALLINE SILICON FILMS PREPARED BY A NOVEL LOW-PRESSURE CHEMICAL VAPOUR DEPOSITION METHOD USING A SI2H6-B2H6-N-2 GAS SYSTEM [J] . Nam SH., Moon J., Shim TE., Journal of Physics, D. Applied Physics: A Europhysics Journal . 1996,第4期

机译：SI2H6-B2H6-N-2气系统用新型低压化学气相沉积法制得的掺硼现场多晶硅硅膜
2. Enhanced electrical and optical properties of boron-doped ZnO films grown by low pressure chemical vapor deposition for amorphous silicon solar cells [J] . Li Wang, Li Yingyi, Du Guoping, CERAMICS INTERNATIONAL . 2016,第1aPta2期

机译：通过低压化学气相沉积法生长的非晶硅太阳能电池掺杂硼的ZnO薄膜具有增强的电学和光学特性
3. Influence of dopant concentration and type of substrate on the local organization of low-pressure chemical vapour deposition in situ boron doped silicon films from silane and boron trichloride [J] . B. Caussat, E. Scheid, B. de Mauduit, Thin Solid Films . 2004,第2期

机译：掺杂剂浓度和衬底类型对低压化学气相沉积硅烷和三氯化硼原位掺硼硅薄膜局部组织的影响
4. Boron-Doped Polysilicon: Growth Kinetics and Structural Study of Low-Pressure Chemical Vapour Deposited Films in the Case of High Doping Levels [C] . E., R. Berjoan, B. de Mauduit, International conference on polycrystalline semiconductors . 2001

机译：掺杂多晶硅：在高掺杂水平的情况下，生长动力学和低压化学气相沉积膜的结构研究
5. Stoichiometric Hydrogenated Amorphous Silicon Carbide Thin Film Synthesis Using DC-Saddle Plasma Enhanced Chemical Vapour Deposition. [D] . Jazizadeh, Behzad. 2013

机译：使用直流等离子体等离子体增强化学气相沉积法合成化学计量的氢化非晶碳化硅薄膜。
6. Tribological and thermal stability study of nanoporous amorphous boron carbide films prepared by pulsed plasma chemical vapor deposition [O] . Shahira Liza, Naoto Ohtake, Hiroki Akasaka, 2015

机译：脉冲等离子体化学气相沉积法制备纳米多孔非晶碳化硼薄膜的摩擦学和热稳定性研究
7. The effect of thermal annealing on the properties of thin alumina films prepared by low pressure metal-organic chemical vapour deposition [O] . V.A.C. Haanappel, D. v.d. Vendel, H.D. van Corbach, 1995

机译：热退火对低压mOCVD制备氧化铝薄膜性能的影响
8. Fundamental studies of defect generation in amorphous silicon alloys grown by remote plasma-enhanced chemical-vapor deposition. Final subcontract report, 1 July 1989--31 December 1992 [R] . Lucovsky, G. 1993

机译：远程等离子体增强化学气相沉积法生长非晶硅合金中缺陷产生的基础研究。最终分包合同报告，1989年7月1日 - 1992年12月31日

A Study on the properties of amorphous boron and borne-silicon alloy films prepared by low pressure chemical vapour deposition.

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