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Fabrication and measurement of a photonic crystal waveguide integrated with a semiconductor optical amplifier

机译:与半导体光放大器集成的光子晶体波导的制造和测量

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摘要

A III-V semiconductor photonic crystal (PhC) waveguide is integrated into a semiconductor optical amplifier (SOA); this has the potential to reshape pulses that are distorted and chirped on propagation through the SOA. The PhC waveguide is modeled using the three-dimensional (3D) finite difference time domain (FDTD) method initially for the ideal case of infinite depth holes, and this shows a ministop band close to 1600 nm. The PhC waveguide is then fabricated into a commercial SOA using focused ion beam etching. The optical power measured at the output of the PhC-SOA waveguide shows evidence of a ministop band but with a small stopband depth. More realistic 3D FDTD modeling including effects of finite hole depth and vertical layer structure is then shown to give much better agreement with measured results. Finally predictions are made for the performance of a membrane structure.
机译:III-V型半导体光子晶体(PhC)波导集成到半导体光放大器(SOA)中;这可能会重塑在通过SOA传播时失真和chi的脉冲。 PhC波导最初是使用三维(3D)有限差分时域(FDTD)方法建模的,最初是针对无限深度孔的理想情况,它显示了接近1600 nm的微停止带。然后使用聚焦离子束蚀刻将PhC波导制成商用SOA。在PhC-SOA波导的输出端测得的光功率显示出一个微停止带,但阻带深度较小。然后显示了更逼真的3D FDTD建模,包括有限孔深度和垂直层结构的影响,可以更好地与测量结果相吻合。最后对膜结构的性能进行了预测。

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