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Visualising discrete structural transformations in germanium nanowires during ion beam irradiation and subsequent annealing

机译:可视化锗纳米线在离子束辐照和后续退火过程中的离散结构转变

摘要

In this article we detail the application of electron microscopy to visualise discrete structural transitions incurring in single crystalline Ge nanowires upon Ga-ion irradiation and subsequent thermal annealing. Sequences of images for nanowires of varying diameters subjected to an incremental increase of the Ga-ion dose were obtained. Intricate transformations dictated by a nanowire's geometry indicate unusual distribution of the cascade recoils in the nanowire volume, in comparison to planar substrates. Following irradiation, the same nanowires were annealed in the TEM and corresponding crystal recovery followed in situ. Visualising the recrystallisation process, we establish that full recovery of defect-free nanowires is difficult to obtain due to defect nucleation and growth. Our findings will have large implications in designing ion beam doping of Ge nanowires for electronic devices but also for other devices that use single crystalline nanostructured Ge materials such as thin membranes, nanoparticles and nanorods.
机译:在本文中,我们详细介绍了电子显微镜的应用,以可视化在Ga离子辐照和随后的热退火之后,单晶Ge纳米线中发生的离散结构转变。获得了随着Ga离子剂量的增加而变化的直径不同的纳米线的图像序列。与平面基板相比,由纳米线的几何形状决定的复杂转换表明级联后坐力在纳米线体积中的分布异常。辐射后,将相同的纳米线在TEM中退火,然后进行原位相应的晶体回收。可视化重结晶过程,我们确定由于缺陷的成核和生长,很难获得无缺陷的纳米线的完全恢复。我们的发现将对设计电子设备中的锗纳米线的离子束掺杂产生重大影响,也将为使用单晶纳米结构锗材料(例如薄膜,纳米颗粒和纳米棒)的其他设备设计。

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