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Characterization of resistivity of Sb2S3 semiconductor nanowires by conductive AFM and in-situ methods

机译:导电原子力显微镜和原位法表征Sb2S3半导体纳米线的电阻率

摘要

Conductive AFM and in situ methods were used to determine contact resistance and resistivity of individual Sb2S3 nanowires. Nanowires were deposited on oxidized Si surface for in situ measurements and on Si surface with macroelectrodes for conductive AFM (C-AFM) measurements. Contact resistance was determined by measurement of I(V) characteristics at different distances from the nanowire contact with the macroelectrode and resistivity of nanowires was determined. Sb2S3 is a soft material with low adhesion force to the surface and therefore special precautions were taken during measurements.
机译:导电原子力显微镜和原位方法用于确定单个Sb2S3纳米线的接触电阻和电阻率。将纳米线沉积在氧化的Si表面上进行原位测量,并使用大电极将其沉积在Si表面上进行导电AFM(C-AFM)测量。通过在距纳米线与大电极接触的不同距离处测量I(V)特性来确定接触电阻,并确定纳米线的电阻率。 Sb2S3是一种柔软的材料,对表面的粘附力低,因此在测量过程中采取了特殊的预防措施。

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