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A first principles analysis of the effect of hydrogen concentration in hydrogenated amorphous silicon on the formation of strained Si-Si bonds and the optical and mobility gaps

机译:氢化非晶硅中氢浓度对应变Si-Si键形成以及光学间隙和迁移率间隙的影响的第一原理分析

摘要

In this paper, we use a model of hydrogenated amorphous silicon generated from molecular dynamics with density functional theory calculations to examine how the atomic geometry and the optical and mobility gaps are influenced by mild hydrogen oversaturation. The optical and mobility gaps show a volcano curve as the hydrogen content varies from undersaturation to mild oversaturation, with largest gaps obtained at the saturation hydrogen concentration. At the same time, mid-gap states associated with dangling bonds and strained Si-Si bonds disappear at saturation but reappear at mild oversaturation, which is consistent with the evolution of optical gap. The distribution of Si-Si bond distances provides the key to the change in electronic properties. In the undersaturation regime, the new electronic states in the gap arise from the presence of dangling bonds and strained Si-Si bonds, which are longer than the equilibrium Si-Si distance. Increasing hydrogen concentration up to saturation reduces the strained bonds and removes dangling bonds. In the case of mild oversaturation, the mid-gap states arise exclusively from an increase in the density of strained Si-Si bonds. Analysis of our structure shows that the extra hydrogen atoms form a bridge between neighbouring silicon atoms, thus increasing the Si-Si distance and increasing disorder in the sample.
机译:在本文中,我们使用分子动力学生成的氢化非晶硅模型和密度泛函理论计算来研究温和的氢过饱和如何影响原子的几何形状以及光学和迁移率间隙。当氢含量从不饱和到轻度过饱和时,光学和迁移率间隙显示出火山曲线,在饱和氢浓度下获得最大的间隙。同时,与悬空键和应变Si-Si键相关的中间能隙状态在饱和时消失,而在轻度过饱和时重新出现,这与光学间隙的演化是一致的。 Si-Si键距的分布为电子特性的变化提供了关键。在欠饱和状态下,间隙中的新电子态是由悬空键和应变Si-Si键的存在而产生的,它们比平衡Si-Si距离更长。将氢浓度增加到饱和会减少应变键并消除悬空键。在轻度过饱和的情况下,中间能隙状态仅由应变Si-Si键的密度增加引起。对我们的结构的分析表明,多余的氢原子在相邻的硅原子之间形成了桥梁,从而增加了Si-Si距离并增加了样品中的无序度。

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