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Atomic vapor deposition of bismuth titanate thin films

机译:钛酸铋薄膜的原子气相沉积

摘要

c-axis oriented ferroelectric bismuth titanate (Bi4Ti 3O12) thin films were grown on (001) strontium titanate (SrTiO3) substrates by an atomic vapor deposition technique. The ferroelectric properties of the thin films are greatly affected by the presence of various kinds of defects. Detailed x-ray diffraction data and transmission electron microscopy analysis demonstrated the presence of out-of-phase boundaries (OPBs). It is found that the OPB density changes appreciably with the amount of titanium injected during growth of the thin films. Piezo-responses of the thin films were measured by piezo-force microscopy. It is found that the in-plane piezoresponse is stronger than the out-of-plane response, due to the strong c-axis orientation of the films.
机译:通过原子气相沉积技术在(001)钛酸锶(SrTiO3)衬底上生长c轴取向铁电钛酸铋(Bi4Ti 3O12)薄膜。各种缺陷的存在极大地影响了薄膜的铁电性能。详细的X射线衍射数据和透射电子显微镜分析表明存在异相边界(OPB)。发现在薄膜生长过程中,OPB密度随注入的钛量而明显变化。通过压电显微镜观察薄膜的压电响应。发现由于膜的强c轴取向,面内压电响应比面外响应更强。

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