Three dimensional HSQ structures formed using multiple low energy electron beam lithography

摘要

A method is presented for the fabrication of three-dimensional (3D) structures formed in Hydrogen Silsequioxane (HSQ) by aprocess of multiple low energy electron beam exposures with a single development step. Structures have been producedconsisting of multiple layers of dielectric rods with widths and heights of 150nm and a separation of 1μm in the horizontalplane and 360nm in the vertical direction.