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Design and fabrication of the microcantilever heater for rapid chemical vapor deposition graphene synthesis

机译:用于快速化学气相沉积石墨烯合成的微悬臂加热器的设计和制造

摘要

This thesis presents the design and the fabrication process of the microcantilever heater for rapid chemical vapor deposition (CVD) graphene synthesis. Two types of 300 nm thick catalytic metals, copper and nickel, are integrated into the heater region ranging from 5 by 5 ??m to 20 by 12 ??m in size. The microcantilever heater is thermally actuated by Joule heating. The fabricated device is able to operate at the graphene synthesis temperature, ranging from 800??C to 1000??C, for longer than an hour without any degradation in functionality. To prevent electrical contact between the doped silicon device layer and the patterned catalytic metal, 200 nm of PECVD silicon nitride is deposited as a passivation layer. Raman spectroscopy measurements show that the temperature along the heater region is uniform with less than 5 % in difference. With rapid local heating and cooling of the fabricated microcantilever heater, the total graphene synthesis time is reduced by more than 90 % compared to conventional CVD. Using a nickel layered microcantilever heater, multilayer graphene was grown and analyzed with Raman spectroscopy. A detailed process flow of the microcantilever heater fabrication process and the device characterization results are explained in detail.
机译:本文提出了用于快速化学气相沉积(CVD)石墨烯合成的微悬臂梁加热器的设计和制造工艺。两种类型的300 nm厚的催化金属(铜和镍)被集成到加热器区域中,尺寸从5 x 5 ?? m至20 x 12 ?? m不等。微悬臂梁加热器通过焦耳加热进行热驱动。所制造的器件能够在800℃至1000℃的石墨烯合成温度下工作超过一小时,而功能没有任何下降。为了防止掺杂的硅器件层和图案化的催化金属之间的电接触,沉积200 nm的PECVD氮化硅作为钝化层。拉曼光谱测量表明,沿加热器区域的温度是均匀的,相差小于5%。与传统的CVD相比,通过快速局部加热和冷却所制造的微悬臂梁加热器,石墨烯的总合成时间减少了90%以上。使用镍层微悬臂梁加热器,生长多层石墨烯并通过拉曼光谱分析。详细解释了微悬臂梁加热器制造过程的详细过程流程和器件表征结果。

著录项

  • 作者

    Kim Hoe Joon;

  • 作者单位
  • 年度 2011
  • 总页数
  • 原文格式 PDF
  • 正文语种 {"code":"en","name":"English","id":9}
  • 中图分类

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