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Residual stress effects on piezoelectric response of sol-gel derived PZT thin films

机译:残余应力对溶胶 - 凝胶衍生pZT薄膜压电响应的影响

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摘要

Piezoelectric properties of three sol-gel derived Pb(Zr0.53Ti0.47)O3 thin film samples integrated on to Pt/Ti/SiO 2//Si substrates are investigated to delineate the influence of residual stress on the strain-field response from other thickness related effects. Residual tensile stresses are determined from wafer curvature measurements for identical films ranging in thickness from 190nm to 500nm. Field-induced strains are measured interferometically for each film under either a large AC driving voltage or a small AC ripple applied over a range of DC biases. Higher residual stresses decrease measured piezoelectric response, while thickness variations with no accompanying change in residual stress state produce little change in strain-field behavior. The diminished performance associated with high residual stresses is attributed to reductions in both linear and nonlinear contributions, including decreased polarization switching and domain motion.
机译:研究了整合到Pt / Ti / SiO 2 // Si衬底上的三个溶胶-凝胶衍生的Pb(Zr0.53Ti0.47)O3薄膜样品的压电性能,以描述残余应力对其他条件下应变场响应的影响。厚度相关的影响。从晶圆曲率测量中确定厚度在190nm至500nm范围内的相同薄膜的残余拉应力。在大的交流驱动电压或施加在一定范围的直流偏置下的小交流波纹下,通过干涉测量每个薄膜的场致应变。较高的残余应力会降低测得的压电响应,而厚度变化却不会伴随残余应力状态的变化而导致应变场行为的变化很小。与高残余应力相关的性能下降归因于线性和非线性影响的减少,包括极化切换和畴运动的减小。

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