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Effect of constrained sintering on the piezoelectric properties of PZT thick films

机译:约束烧结对PZT厚膜压电性能的影响

摘要

This thesis concerns the processing of thick lead zirconate titanate (PZT) films integrated with rigid substrates. The aim was to better understand the evolution of the microstructure, stress, and electrical properties of the films under constrained sintering conditions. This is an important process to understand because of the degrading effects that constrained sintering has on PZT films, which are employed vastly in commercial applications. It is hypothesised that the better understandings can lead to the development of PZT films that exhibit superior dielectric and piezoelectric properties than those in current production. The shrinkage of PZT films was examined in order to better understand the ways in which the rigidity of the substrate affects densification during sintering. This was done by processing isolated regions of PZT film on silicon substrates. These were sintered using a halogen bulb which exhibited a spot at a temperature of 725°C and with a ramp rate of less than 10 seconds. In this way the sintered regions could be ‘frozen’ mid sintering. The shrinkage of the films was determined at various sintering times. It was found that film shrinkage had finished within 2 minutes of sintering. The evolution of the constrained films during sintering was then examined as a function of the microstructure, stress and electrical property development. It was found that the grain sizes and electrical properties increased within 2 minutes of sintering. However, at longer sintering times there was a degradation of the films. Furthermore, tensile stresses developed during sintering which had degrading effects. This work was expanded upon by motioning the PZT films in a single line scan through the sintering spot to sinter larger areas of the film in one motion. This resulted in a high control over the sintering times, which was vital as the highest electrical properties were found at short sintering times. Next it was examined if the electrical properties could be further increased by applying a compressive stress. It was found that the dielectric properties increased as a result of increased domain wall vibrations. However, there was a decrease in domain reorientation during poling as a result of the effect of the compressive stress, thus the piezoelectric properties reduced. The evolution of PZT films under constrained sintering was better understood as a result of these studies, and led to the development of a sintering method in which the dielectric and piezoelectric properties were increased.
机译:本文涉及与刚性基板集成的厚锆钛酸铅(PZT)薄膜的加工。目的是更好地了解在受限烧结条件下薄膜的微观结构,应力和电性能的演变。由于受约束的烧结对PZT膜的降解作用,这是一个重要的过程,PZT膜在商业应用中被广泛使用。据推测,更好的理解可以导致PZT薄膜的发展,该薄膜具有比目前生产的PZT薄膜更好的介电和压电性能。检查PZT膜的收缩率是为了更好地理解烧结过程中基材刚度影响致密化的方式。这是通过在硅基板上处理PZT膜的隔离区域来完成的。使用卤素灯泡将其烧结,该卤素灯泡在725°C的温度下具有斑点,并且升温速率小于10秒。这样,烧结区域可以在烧结过程中被“冻结”。在不同的烧结时间下测定膜的收缩率。发现在烧结后2分钟内膜收缩已经完成。然后检查烧结过程中受约束的薄膜的演变与微观结构,应力和电性能发展的关系。发现在烧结的2分钟内晶粒尺寸和电性能增加。但是,在较长的烧结时间下,薄膜会降解。此外,在烧结过程中产生的拉应力具有降解作用。通过单行扫描PZT薄膜穿过烧结点,以一次动作烧结较大面积的薄膜,扩大了这项工作。这导致了对烧结时间的高度控制,这是至关重要的,因为在较短的烧结时间下发现了最高的电性能。接下来,检查是否可以通过施加压应力来进一步提高电性能。已经发现,由于畴壁振动的增加,介电性能增加。但是,由于压缩应力的作用,极化过程中畴重新取向减少,因此压电性能降低。这些研究的结果更好地理解了在受限烧结下PZT膜的演变,并导致了介电和压电性能得到提高的烧结方法的发展。

著录项

  • 作者

    Tillman Mark;

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  • 年度 2012
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  • 原文格式 PDF
  • 正文语种 {"code":"en","name":"English","id":9}
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