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Extended wavelength mid-infrared photoluminescence from type-I InAsN and InGaAsN dilute nitride quantum wells grown on InP

机译:I型InAsN和InGaAsN在InP上生长的稀氮化物量子阱的扩展波长中红外光致发光

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摘要

Extended wavelength photoluminescence emission within the technologically important 2–5 micrometer spectral range has been demonstrated from InAs1xNx and In1yGayAs1xNx type I quantum wells grown onto InP. Samples containing N 1% and 2% exhibited 4K photoluminescence emission at 2.0 and 2.7 lm, respectively. The emission wavelength was extended out to 2.9 lm (3.3 lm at 300 K) using a metamorphic buffer layer to accommodate the lattice mismatch. The quantum wells were grown by molecular beam epitaxy and found to be of a high structural perfection as evidenced in the high resolution x-ray diffraction measurements. The photoluminescence was more intense from the quantum wells grown on the metamorphic buffer layer and persisted up to room temperature. The mid-infrared emission spectra were analysed, and the observed transitions were found to be in good agreement with the calculated emission energies.
机译:已从生长在InP上的InAs1xNx和In1yGayAs1xNx I型量子阱证明了在技术上重要的2-5微米光谱范围内的扩展波长光致发光发射。含N 1%和2%的样品分别在2.0和2.7 lm下显示4K光致发光。使用变质缓冲层将发射波长扩展到2.9 lm(300 K下为3.3 lm)以适应晶格失配。量子阱通过分子束外延生长,并且发现具有高度的结构完善性,这在高分辨率X射线衍射测量中得到了证明。生长在变质缓冲层上的量子阱的光致发光强度更高,并持续到室温。分析了中红外发射光谱,发现观察到的跃迁与计算出的发射能量高度吻合。

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