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The effect of annealing temperature on the optical properties of a ruthenium complex thin film

机译:退火温度对钌配合物薄膜光学性能的影响

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摘要

The stability of the optical parameters of a ruthenium polypyridyl complex (Ru-PC K314) film under varying annealing temperatures between 278 K and 673 K was investigated. The ruthenium polypyridyl complex thin film was prepared on a quartz substrate by drop casting technique. The transmission of the film was recorded by using Ultraviolet/Visible/Near Infrared spectrophotometer and the optical band gap energy of the as-deposited film was determined around 2.20 eV. The optical parameters such as refractive index, extinction coefficient, and dielectric constant of the film were determined and the annealing effect on these parameters was investigated. The results show that Ru PC K314 film is quite stable up to 595 K, and the rate of the optical band gap energy change was found to be 5.23 × 10- 5 eV/K. Furthermore, the thermal analysis studies were carried out in the range 298-673 K. The Differential Thermal Analysis/Thermal Gravimmetry/Differantial Thermal Gravimmetry curves show that the decomposition is incomplete in the temperature range 298-673 K. Ru-PC K314 is thermally stable up to 387 K. The decomposition starts at 387 K with elimination of functional groups such as CO2, CO molecules and SO3H group was eliminated between 614 K and 666 K.
机译:研究了钌多吡啶基配合物(Ru-PC K314)薄膜在278 K和673 K之间变化的退火温度下的光学参数的稳定性。通过滴铸技术在石英衬底上制备钌多吡啶基络合物薄膜。通过使用紫外/可见/近红外分光光度计记录膜的透射率,并确定沉积膜的光学带隙能量为2.20eV左右。确定了薄膜的折射率,消光系数和介电常数等光学参数,并研究了退火对这些参数的影响。结果表明,Ru PC K314薄膜在高达595 K的温度下都非常稳定,发现光学带隙能量的变化率为5.23×10-5 eV / K。此外,在298-673 K范围内进行了热分析研究。差示热分析/热重分析/差示热重分析曲线表明,在298-673 K的温度范围内分解是不完全的。Ru-PC K314是热分解的分解稳定在387K。分解开始于387 K,并消除了614 K和666 K之间的官能团,例如CO2,CO分子和SO3H基团。

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