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Dense Fe cluster-assembled films by energetic cluster deposition

机译:高能团簇沉积致密的铁团簇薄膜

摘要

High-density Fe cluster-assembled films were produced at room temperature by an energetic cluster deposition. Though cluster-assemblies are usually sooty and porous, the present Fe cluster-assembled films are lustrous and dense, revealing a soft magnetic behavior. Size-monodispersed Fe clusters with the mean cluster size d=9 nm were synthesized using a plasma-gas-condensation technique. Ionized clusters are accelerated electrically and deposited onto the substrate together with neutral clusters from the same cluster source. Packing fraction and saturation magnetic flux density increase rapidly and magnetic coercivity decreases remarkably with increasing acceleration voltage. The Fe cluster-assembled film obtained at the acceleration voltage of -20 kV has a packing fraction of 0.86+/-0.03, saturation magnetic flux density of 1.78+/-0.05 Wb/m(2), and coercivity value smaller than 80 A/m. The resistivity at room temperature is ten times larger than that of bulk Fe metal. (C) 2004 American Institute of Physics.
机译:通过高能簇沉积在室温下制备高密度铁簇组装膜。尽管团簇通常是烟熏状和多孔的,但是目前的Fe团簇膜有光泽且致密,显示出软磁行为。使用等离子体-气体冷凝技术合成平均簇尺寸为d = 9 nm的尺寸单分散的Fe簇。电离的团簇被电加速并与来自同一团簇源的中性团簇一起沉积到基板上。随着加速电压的增加,填充率和饱和磁通密度迅速增加,而矫顽磁力显着下降。在-20 kV的加速电压下获得的铁簇组装膜的堆积分数为0.86 +/- 0.03,饱和磁通密度为1.78 +/- 0.05 Wb / m(2),矫顽力值小于80 A /米。室温下的电阻率是块状Fe金属的电阻率的十倍。 (C)2004美国物理研究所。

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