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User's Guide for the Industrial Source Complex (ISC3) Dispersion Models. Volume211 2. Description of Model Algorithms. Addendum

机译:工业源复合体(IsC3)色散模型用户指南。第221卷2.模型算法的描述。附录

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This document provides a technical description of model algorithms for recent211u001eenhancements of the ISCST3 model, including the most recent version dated 99155. 211u001eThe algorithms described in this Addendum include the gas dry deposition 211u001ealgorithms based on the draft GDISCDFT model (dated 96248), and the optimization 211u001eof the area source algorithm. Both of these enhancements are associated with the 211u001enon-regulatory default TOXICS option introduced with version 99155 of ISCST3 A 211u001ebrief description of the user instructions for these new options is presented in 211u001ethe accompanying Addendum to Volume I of the ISC3 model user's guide 211u001e(ISC3ADD1.WPD).

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