JOEL News. Vol. 28E, No. 1, August 1, 1990. Electron Optics Instrumentation

摘要

;Contents: 400 Kilovolt high resolution electron microscopy of semiconductors--the current state of the art; Application of a JEM-2010 electron microscope to high resolution imaging and convergent-beam electron diffraction; Quantification of electron diffraction and high resolution electron microscopy with imaging plate; Biological usefulness of an intermediate voltage electron microscope--JEM-4000EX; An advanced control system developed for the JSM-6400; Development of an ultra high vacuum scanning tunneling microscope (UHV-STM); Focused ion beam direct writing for fabrication of quantum wire In-Plane-Gated (IPG) transistors and integrated circuits.