Stigmatically Focusing Partial Pressure Analyzer with Dual Chamber Ion Source

摘要

The partial pressure analyzer developed has a high absolute sensitivity and high resolution. Interaction effects, as they occur in conventional partial pressure analyzers between the heating filament for the emission of electrons and the residual gas, are suppressed by removing the heating filament from the measurement area. The electron beam is generated in an auxiliary vacuum compartment, and passes subsequently through an aperture into the ionization compartment. The probability is small, therefore, that the presence of substances produced at the heating filament by chemical reactions and thermal decompositions will have disturbing effects. The high sensitivity and resolution of the instrument are obtained with the aid of an electron path configuration of unconventional characteristics.