THE GROWTH OF THIN NICKEL FILMS ON A (111) ALUMINIUM SURFACE

摘要

Nickel films 35 A thick were deposited in UHV on to clean (111) aluminum surfaces at various temperatures between 70ºC C and 330 C, to determine over what temperature range one can obtain a thin continuous layer of Ni or Ni rich phase.nAt 70º C the Ni formed an epitaxial layer containing small epitaxial particles of AISI. At 250º C a continuous layer of Al3Ni was produced with no o preferred orientation. At 330 C an island structure was obtained with the islands elongated in the Al<110> directions;the islands were unstable at 330 C and tended to become spherical to minimize their surface area.