In-situ crystallization of silicate glass films deposited on (alpha)- Al(sub 2)O(sub 3).

摘要

Ca aluminosilicate glass films were grown on single-crystal (alpha)-Al(sub 2)O(sub 3) at <950 C by pulsed-laser deposition. The films were then heated in an electron microscope to determine the effect of (alpha)-Al(sub 2)O(sub 3) crystallography on crystallization of Ca-aluminosilicate glasses. 4 figs, 5 refs. (DLC)