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Growth of multilayered epitaxial films by pulsed excimer laser ablation

机译:通过脉冲准分子激光烧蚀生长多层外延膜

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摘要

The characteristics of pulsed laser ablation for epitaxial film growth are reviewed. New developments in the growth of heteroepitaxial multilayers, stabilization of metastable phases, and growth of semiconductor alloys with continuously variable composition, are described.

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