Correlation of hot-carrier stress and ionization induced degradation in bipolar transistors

摘要

The correlation of hot carrier stress and ionization induced gain degradation in npn BJTs was studied to determine if hot-carrier stress could be used as a hardness assurance tool for total dose. The correlation was measured at the wafer level and for several hardening variations for a single process technology. Additional experiments are planned and will be presented in the full paper. Based on a detailed physical analysis of the mechanisms for hot-carrier stress and ionization no correlation was expected. The results demonstrated the lack of correlation and indicate that hot-carrier stress degradation is not a predictor of total dose response.