Using a real-time, Surface Acoustic Wave (SAW) sensing instrument supplied by Femtometrics, we have measured organic contamination, or nonvolatile residues (NVR), in both a cleanroom and a microenvironment. To demonstrate the real-time NVR detectability and sensitivity of the SAW instrument, controlled contamination experiments with photoresist material were also conducted. In addition, two cleaning methods for removing contamination from used sensors have been evaluated. One technique uses the on-board temperature varying capability of the SAW instrument, while the other technique utilizes a uv-ozone cleaner for the sensor cleaning. Preliminary results from SAW measurements in the cleanroom and in a microenvironment and tests to evaluate sensor cleaning techniques are presented in this report. A concluding summary with an assessment of the current SAW instrument and potential future applications for this technology is also presented.
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