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Estimated Costing of an EUV Mask Inspection Microscope. Report 4 for AIM Design Study

机译:EUV掩模检查显微镜的估算成本。 aIm设计研究报告4

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This document is the fourth sub-report of the EUV AIM design study being conducted at LLNL on behalf of International SEMATECH (ISMT) and addresses the issue of preliminary system costing. The purpose of the LLNL study, as identified in section 1.2 of the statement of work, is to research the basic user requirements of an actinic defect characterization tool, potential design configurations and top-level specifications. The objectives of this design study specifically identified in section 1.3 of the statement of work were to 1. Determine the user requirements of an actinic defect characterization tool; 2. Determine if an EUV AIM tool is an appropriate platform for actinic defect characterization; 3. Determine possible design configurations and top-level performance specifications; 4. Identify potential technical issues and risks of different technical approaches; 5. Provide estimates of cost relating to different technical approaches; and 6. Provide simulated performance for key subsystems and the entire system. There are 10 subsections of the study; this report addresses item 8, system costing, and is provided as a separate report so that its content can be kept confidential at the discretion of ISMT. In this analysis we cost two systems - one based on normal-incidence multilayer-coated optics and another based on zone plate optics. The costing of these two systems are provided separately because the fabrication costs and technical challenges associated with each approach are different in areas relating to optics fabrication, and are highlighted by providing separate costing for the two approaches.

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