SELECTIVE SOLVENT-INDUCED REVERSIBLE SURFACE RECONSTRUCTION OF DIBLOCK COPOLYMER THIN FILMS.

摘要

Through the use of a selective solvent a reversible surface reconstruction of diblock copolymer thin films was observed. The solvent selectivity and solubility of the minor component block were found to be crucial to generate nanoporous films with pores that penetrate through entire film thickness. The process was shown to be reversible by thermal annealing and was easily monitored using in-situ grazing incidence small angle x-ray scattering and scanning force microscopy. At temperatures of 60-90 C, only a small fraction of the nanopores relaxed to regenerate the original nanotemplate. However, by heating to 90-100 C, the original nanotemplate was completely regenerated. Even though the bulk mobility of PS and PMMA is low at these temperatures, the local mobility required to regenerate the template was sufficient.