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Characterization of advanced EUV resists using the Berkeley METtool

机译：使用Berkeley mETtool表征先进的EUV抗蚀剂

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年度 2006
页码 1-25
总页数 25
原文格式 PDF
正文语种 eng
中图分类工业技术;
关键词
36; EXTREME ULTRAVIOLET RADIATION; MASKING; INTEGRATED CIRCUITS; TESTING;

机译：36;极端紫外线辐射;掩蔽;集成电路;测试;

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1. Absorption Coefficient Measurement Advanced Method of EUV Resist by Direct-Resist Coating on a Photodiode [J] . Shota Niihara, Daiki Mamezaki, Masanori Watanabe, Journal of Photopolymer Science and Technology . 2017,第1期

机译：在光电二极管上进行直接抗蚀涂层的EUV抗蚀剂吸收系数测量的先进方法
2. Advanced resist testing using the SEMATECH Berkeley extreme ultraviolet microfield exposure tool [J] . Patrick P. Naulleau, Christopher N. Anderson, Kim Dean, Journal of Vacuum Science & Technology. B, Microelectronics and Nanometer Structures . 2007,第6期

机译：使用SEMATECH Berkeley极紫外微场曝光工具进行高级抗蚀剂测试
3. Characterization Studies on Metal-based EUV Resist Film Properties [J] . Santillan Julius Joseph, Itani Toshiro Journal of Photopolymer Science and Technology . 2018,第5期

机译：金属基抗蚀剂膜性能的表征研究
4. The SEMATECH Berkeley MET: demonstration of 15-nm half-pitch in chemically amplified EUV resist and sensitivity of EUV resists at 6.x-nm [C] . Chris Anderson, Lorie Mae Baclea-An, Suchit Bhattari, Conference on extreme ultraviolet (EUV) lithography III . 2012

机译：SEMATECH Berkeley MET：展示化学放大的EUV抗蚀剂中的15nm半间距和EUV抗蚀剂在6.xnm处的灵敏度
5. Molecular resists for advanced lithography - design, synthesis, characterization, and simulation. [D] . Lawson, Richard A. 2011

机译：用于高级光刻的分子抗蚀剂-设计，合成，表征和模拟。
6. Advanced approaches for quantitative characterization of thermal transport properties in soft materials using thin conformable resistive sensors [O] . Kaitlyn E. Crawford, Yinji Ma, Siddharth Krishnan, -1

机译：使用薄的适形的电阻传感器对软材料中的热传输特性进行定量表征的先进方法
7. Characterization of advanced EUV resists using the Berkeley METtool [O] . Naulleau, Patrick 2006

机译：使用Berkeley mETtool表征先进的EUV抗蚀剂

Characterization of advanced EUV resists using the Berkeley METtool

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