A VERSATILE CATHODIC ETCHER

摘要

A cathodic etcher that can be used both for investigating sane of the problems encountered in ion bombardment etching and for routinely preparing metallographic samples is described. Important features of this instrument include short pumpout times, venire control of the vacuum and argon flow during etching, and a simple method of focusing the argon beam. A special technique allows plastic-mounted specimens to be etched. The effects of pressure and voltage on etching efficiency and the benefits that may be gained from using very low pressures in the etching chamber are discussed.