MM-Wave Cavity/Klystron Developments Using Deep X-Ray Lithography at the Advanced Photon Source

摘要

Recent microfabrication technologies based on LIGA (German acronym for Lithographe, Galvanoformung, und Abformung) have been applied to build high-aspect-ratio, metallic or dielectric, planar structures suitable for high-frequency rf cavity structures. The cavity structures would be used as parts of linear accelerators, microwave undulators, and mm-wave amplifiers. The microfabrication process includes manufacturing of precision x-ray masks, exposure of positive resist by x-rays through the mask, resist development, and electroforming of the final microstructure. Prototypes of a 32-cell, 108-GHz constant impedance cavity and a 66-cell, 94-GHz constant-gradient cavity were fabricated using the synchrotron radiation sources at APS. Preliminary design parameters for a 91-GHz modulator klystron along with an overview of the new technology are discussed.