THICK ADHERENT METAL COATINGS BY MEANS OF TWO CATHODES IN A GLOW DISCHARGE

摘要

Adherent metal coatings up to 0.40 mm thick were deposited onto metal substrates by means of two cathodes in a glow discharge. The samples to be coated were mounted on one of the cathodes. These samples were cleaned before and also during deposition by ion bombardment sputtering. The other cathode contained the coating material in a tray. The tray was thermally insulated from its supports. Thus the tray and contents could be heated so that the coating material evaporated. The initial layers of the coating may be deposited by bias sputtering;however the bulk of the coating was deposited at rates up to 0.015 mm/min when the coating material evaporated. The method may be defined as evaporation-abetted bias sputtering.