Thermal Stability and Decomposition Kinetics of Amorphous Hydrogenated Films

摘要

The kinetics of decomposition of the = SiH sub 2 and identical with SiH centers in amorphous hydrogenated silicon films have been studied by thermomanometric analysis. The methods of preparation and analysis are described. Experimental values of the enthalpy and entropy of activation are given in both cases. Tentative reaction mechanisms are proposed on the basis of an interpretation of the results. (ERA citation 04:044482)