首页> 美国政府科技报告 >Marginal Stability and Critical Thickness of Strong Double Layers
【24h】

Marginal Stability and Critical Thickness of Strong Double Layers

机译:强双层边缘稳定性和临界厚度

获取原文

摘要

Previous investigations of the stability, in particular the critical thickness for marginal stability, of an electron configuration of double layer type are extended in order to include effects of (i) unequal plasma densities in the field-free regions, and (ii) finite values of the parameter e delta phi/kTsub(e). The results obtained are compared to the corresponding quantities in various experiments, and a striking coincidence is found. (Atomindex citation 13:662921)

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号