High Precision Damage-Resistant Multiple-Pass Ultraviolet Reflectometer

摘要

A multiple-pass cell was reported by John White in 1942. Since them, it has been adapted for use as a high-precision reflectometer. The multiple-pass reflectometer has been studied and reported by Arnon and Baumeister. Here, a reflectometer which is similar is described. It utilizes a uv laser operating at lambda = 351 nm as the source and the White-cell mirrors are high-reflection dielectric coatings designed for that wavelength. Because of the low-loss reflectors used in the cell, a high number of traversals, reflections, can be achieved; R greater than or equal to 239. The use of dielectric mirrors also improves the damage resistance of the apparatus which is important when a uv laser beam is used. The results of reflectance measurements performed on several ultraviolet high reflectors are also reported. These include conventional dielectric coatings as well as a hybrid coating consisting of Al sub 2 O sub 3 , HfO sub 2 , and SiO sub 2 layers. The Los Alamos optical damage laboratory has observed and defined several types of laser-induced damage to optical materials. In the case of high reflection, multi-layer, dielectric coatings, damage may be defined as any change in the coating layers or at the substrate interface which causes a measurable change in reflectance at its design wavelength. Since most dielectric high reflectors have reflectances approaching unity, and a change caused by laser irradiation can be minute, a precise method for measuring high reflectance must be utilized. A multiple-pass reflectometer based on the White cell was selected because of its demonstratd precision and high accuracy. It utilizes a laser as the source for reasons described later. (ERA citation 11:007647)