Short Range Bonding Interaction at Metal-Metal Interfaces

机译：金属 - 金属界面的短程键合相互作用

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Freshly deposited Mo surfaces were exposed to a beam of sputtered Ta atoms for varying, controlled lengths of time. The resultant number of deposited Ta atoms/cm exp 2 was subsequently measured using Rutherford Backscattering. (ERA citation 10:037073)

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Bennett, W. R.; Leavitt, J. A.; Falco, C. M.;
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年度 1984
页码 1-3
总页数 3
原文格式 PDF
正文语种 eng
中图分类工业技术;
关键词
Molybdenum; Tantalum; Backscattering; Deposition; Deposits; Interfaces; Layers; Rutherford Scattering; Surfaces;

机译：钼;钽;后向散射;沉积;沉积;界面;层;卢瑟福散射;表面;

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Short Range Bonding Interaction at Metal-Metal Interfaces

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