Pyrolysis of Ammonolyzed or Hydrolyzed Perchlorosilane Films

摘要

A method of producing silicon nitride and silicon dioxide examined in this project uses the perchlorosilanes SiCl4, Si2 Cl6, and Si3 Cl8. These perchlorosilanes are liquid under ambient conditions which allows them to be easily spread out as thin films on substrates. The perchlorosilanes react with ammonia to produce silicon imides which, upon heating, produce silicon nitride. Similarly, the perchlorosilanes may be reacted with water to form silicic acids which, upon heating, produce silicon dioxide. The perchlorosilanes were first synthesized, then deposited as thin films on silicon. The reactions mentioned above were then carried out to test whether silicon nitride and silicon dioxide will form as thin films by this process, thus possibly providing a new route to the manufacture of these important materials. 82 refs., 20 figs., 6 tabs. (ERA citation 14:017807)