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Development of Tin Oxide Coatings for Use as Electrodes in Mercuric Iodide Photodetector Applications

机译：在碘化汞光电探测器应用中用作电极的氧化锡涂层的开发

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摘要

Plasma processing parameters for depositing thin, conductive, tin oxide films on HgI sub 2 substrates at relatively low temperatures were determined. In addition, relative quantum efficiency measurements as a function of wavelength for HgI sub 2 photodetectors possessing plasma-deposited electrodes are reported. 16 refs., 5 figs. (ERA citation 14:004747)

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作者
Hays, A. K. ; Hughes, R. C.;
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年度 1988
页码 1-16
总页数 16
原文格式 PDF
正文语种 eng
中图分类工业技术;
关键词
Mercury Iodides; Photodetectors; Tin Oxides; Coatings; Electrodes; Deposition; Infrared Spectra; Microstructure; Plasma; Polarization; Quantum Efficiency; Thin Films;

机译：碘化汞;光电探测器;氧化锡;涂层;电极;沉积;红外光谱;微结构;等离子体;极化;量子效率;薄膜;

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Development of Tin Oxide Coatings for Use as Electrodes in Mercuric Iodide Photodetector Applications

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