Characterization of Imperfections in Thin-Film Multilayer Devices

摘要

The fabrication of high reflectivity multilayer monochromators usually involves depositing a greater number of bilayers than the calculated number for perfect multilayers. This deviation from ideal behavior occurs due to the presence of imperfections in layers. The imperfections are strongly dependent on the deposition process employed and the parameters during deposition. An understanding of the types of imperfections present may lead to attempts to minimize them. The imperfections should be taken into consideration for determining the sequence of d-spacing for making a supermirror. 11 refs., 4 figs., 2 tabs. (ERA citation 13:054786)