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Heteroepitaxy of GaAs on Si: Methods to Decrease the Defect Density in the Epilayer.

机译:si上Gaas的异质外延:降低外延层中缺陷密度的方法。

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摘要

In this paper, the fundamental mechanisms of defects formation and procedures used to improve the structural quality of GaAs grown on Si are discussed. Patterned growth, strained-layer superlattices, and proper thermal cycling are promising approaches to help achieve high quality GaAs layers grown on Si substrates. 55 refs., 9 figs.

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