X-ray characterization of a three-element condenser system for soft x-ray projection lithography.

摘要

A three-element condenser system has been fabricated and coated with multilayer reflectors designed to operate at a wavelength of 13.3 nm. The performance of the condenser system was evaluated by measuring the reflectance of the individual condenser mirrors at normal incidence and modeling the system transport efficiency. Although a transport efficiency of 17% should be attainable with this design, actual condenser performance will be reduced because of d-spacing variations on mirror C2 and surface roughness on mirror C3. Replacement mirrors C2 and C3 are being fabricated to recover system performance.